Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Both scan automated test pattern generation (ATPG) patterns and IJTAG patterns 1,2,3 are created for a piece of logic that is part of a much larger design. For both, the patterns are independent from ...

Upcoming 14A and 10A process nodes will use high-NA EUV anamorphic scanners, which will require two stitched half-fields to achieve the equivalent wafer exposure area of previous-generation scanners, ...